Contour based metrology: “make measurable what is not so"

Bertrand Le-Gratiet (1) , Regis Bouyssou (1) , Julien Ducote (1) , Alain Ostrovsky (1) , Charlotte Beylier (1) , Christian Gardin (1) , Nivea Schuch (2) , Vincent Annezo (2) , Loïc Schneider (2) , Matthieu Millequant (2) , Paolo Petroni (2) , Thiago Figueiro (2) , Patrick Schiavone (3)

1 ST-CROLLES - STMicroelectronics [Crolles]
2 Aselta-nanographics [Grenoble]
3 LTM - Laboratoire des technologies de la microélectronique

Domains: Micro and nanotechnologies/Microelectronics

Bertrand Le-Gratiet, Regis Bouyssou, Julien Ducote, Alain Ostrovsky, Charlotte Beylier, et al.. Contour based metrology: “make measurable what is not so". Metrology, Inspection, and Process Control for Microlithography XXXIV, Feb 2020, San Jose, United States. pp.3, ⟨10.1117/12.2551907⟩. ⟨hal-03093860⟩